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Semiconductor Equipment 1014-612-00360-E01 – High-Tech Processing
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Semiconductor Equipment 1014-612-00360-E01 – High-Tech Processing
| Maker | Semiconductor Equipment |
| Model ID | 1014-612-00360-E01 |
| Voltage Rating | 208-240V AC |
| Country | United States |
| Weight (kg) | 15.8 kg |
| Dimensions (L×W×H) | 350 x 250 x 180 mm |
| Service Warranty | 1 year |
| Standards | SEMI S2, CE, FCC |
| MPN | 1014-612-00360-E01 |
| Box Contents | Processing Unit, Power Cable, Interface Adapter, Installation Manual |
| Process Type | Plasma Etching |
| RF Power Output | 600W |
| Gas Compatibility | CF4, O2, Ar, SF6 |
| Chamber Material | Anodized Aluminum |
| Substrate Size | Up to 200 mm wafers |
| Pressure Range | 10-500 mTorr |
High-tech semiconductor processing equipment for precise etching and deposition in cleanroom environments.
Key benefits: • 600W RF power for efficient etching of advanced materials
• Supports multiple process gases for versatile recipes
• Handles up to 200 mm wafers for production flexibility
• Robust anodized aluminum chamber for durability
• Compliant with SEMI S2 safety standards
Typical applications: Semiconductor wafer fabrication, MEMS manufacturing, LED production, research labs
Lifecycle: Active
1 review for Semiconductor Equipment 1014-612-00360-E01 – High-Tech Processing
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Susan Y. –
Excellent built quality. Integrated easily into our existing control system.